Zirconium Oxide is one of the early developed substrate and was used to many kinds of films. ZrO₂ needs a doping of element Yttrium to stabilize its crystal structure so it is called YSZ (Yttrium stabilized Zirconium oxide) normally. It has good mechanical, physical and chemical properties for films.
　

Crystal structure	Cubic, m3m
Cell parameter	a=5.147Å
Melting point	2973°K
Density	6.0g/cm3
Hardness (Mohs)	8-8.5
Thermal expansion (°C)	10.3x10-6
Dielectric constant	ε=27
Growth Method	Arc Melt

Substrate Specifications:
Standard Size: 1"x1",Ф1″, 20x20, 10x10, 10x5, 10x3mm…or customer design.
Thickness: 0.5mm, 1.0mm.
Thickness tolerance: ±0.02mm or ±0.005mm for special order;
Polishing: one or two sides
Orientation: <100> <110> <111>
Orientation accuracy: ±0.5°
Edge Orientation accuracy: 2°(or 1°for special order)
Cut with special tilt angle : available(tilt angle:1°-45°)
Micro Roughness Ra: ≤5Å(5μm×5μm)