Magnesium Oxide substrate is widely used for various films: magnet film,
semiconductive film, optical film as well as high Tc superconductive film. MgO
crystal is possible to get large size (larger than 2 inch) and has low
dielectric loss in microwave band, so it is an important material for high Tc
superconductive microwave devices in the mobile communication as well as other
industrial areas.
| Crystal structure |
cubic m3m Nacl type |
| Cell parameter |
a=4.213 |
| Melting poing |
3250°K |
| Density |
3.58g/cm3 |
| Specific Heat |
0.879J/g∙k(300°K) |
| Thermal conductivity |
59W/m∙k(300°K) |
| Thermal expansion |
11x10-6K-1(300°K) |
| Hardness (Mohs) |
5.5 |
| Growth |
Arc Melt |
Substrate Specifications:
Standard Size: 2”×2”, Ф2″, 1”×1”, 20×20, 10×10, 10×5, 10×3mm…or
customer design
Thickness: 0.5mm, 1.0mm
Thickness tolerance: ±0.02mm or ±0.005mm for special order
Polish: one or two sides
Orientation: <100> <110> <111>
Orientation accuracy: ±0.5°
Edge Orientation accuracy: 2°(or 1°for special order)
Cut with special tilt angle: available (tilt angle:1°－45°)
Micro roughness Ra: ≤5Å(5μm×5μm)
